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BEIJING GRISH HITECH CO.LTD.

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BEIJING GRISH HITECH CO.LTD.
BEIJING GRISH HITECH CO.LTD.
China
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Name:Ms. teresa king [Sales]
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Address:Rm401,Block C,Zhongguancun Development Building, No.12 Shangdi Information Rd, Haidian District,Beijing,China, 100085
Beijing 100085, Beijing
China
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Registration Date:May. 24, 2023
Last Updated:Jul. 6, 2010
Business Nature:Manufacturing, Trade of Chemicals category

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Company Brief

Beijing Grish Hitech Co., Ltd. is a Sino-Japan joint venture, specializing in the research and manufacture of polishing material. Company is established on year 2001. Located at Zhongguancun Hi-tech district of Beijing, China.GRISH manufactures superior quality lapping film, polishing slurries and fine diamond powder, which are widely applied in fiber optics, micro motor, steel roller, hard disk, semiconductor, LCD, LED etc.
GRISH is ISO 9001: 2000, ISO14001: 2004 and OHSAS 18001: 1999 registered and SGS and ROHS certified, those international standards prove we have ability to satisfy any evaluation system from supplier world wide
Provide a perfect solution to meet customerâ s requirements is our mission. At GRISH, we not only integrate the advanced technology of application and continuous innovation but also constantly improve our quality control and service to meet the ever-changing needs from our customers.
Any requests or problems you have on the finishing, polishing or lapping of ceramics, steel, glass, tungsten, silicon, and alloy etc, you should be able to get answers or technical advices from GRISHâ s highly knowledged engineers. We are committed to provide you the best products and best services.

Major Products / Services
Seller:
  • Diamond Polishing Film
    GRISH lapping film is coated with precisely graded minerals (such as diamond, aluminum oxide, silicon carbide, silicon oxide, cerium oxide and so on) on the high strength polyester backing to provide a uniform, consistent finish. Available in 0.01-45 ¼m grades, with or without PSA (Pressure Sensitive Adhesive) backing.
    Feature
    ·High removal rate and superior surface finishing
    ·Consistent finishing performance
    ·High durability and cost reduction
    ·Available for dry polishing and wet polishing
  • Grish precise Ceo2 polishing film
    Features:
    Ï The product grinding aid is the good shaped micro or nanometer Ceo2 micro powder with high concentrated granularity and perfect polishing performance.
    Ï Adherend adopts the macromolecule material and has the perfect characteristics of water proof and alcohol resistance
    Ï Base materials are high strength film with the features of good heat resistance and stretch proof
    Ï Unique formulation technique ensures the evenly suspension of the grinding aid granularity
    Ï Stable high quality and little difference of different batches
    Ï high strength and good flexility of coating film ensure an ideal polishing effort
    Application:
    Ï Can be used for the final polishing of fiber optical and precise polishing of fiber components
    Ï Recommended optical fiber polishing technique: five steps are as follows:
    SC30/ 15 glue removal
    D9 coarse polishing
    D3 medium polishing
    D1 fine polishing
    Ceo2 final polishing

    Important notes:
    1. Clean the surface of Ceo2 polishing film with alcohol before using.
    2. Moisten the rubber mat and put the Ceo2 polishing film carefully on it to make them adhere totally
    3. Drop 2-4ml polishing slurry to the polishing film(SOQ-12D0 is recommended) and put the jigs carefully on it to avoid unexpected scratch.
    4. Set the polishing time and pressure when using and clean the polishing film after usage
  • Grish precise Al2O3 polishing film
    Features:
    Ï The product grinding aid is the good shaped micro or nanometer a-white diamond jade micro powder with good cutting ability and high abrasive resistance
    Ï Adherend adopts the macromolecule material and has the perfect characteristics of water proof and alcohol resistance
    Ï Unique formulation technique ensures the evenly suspension of the grinding aid granularity
    Ï Stable high quality and little difference of different batches
    Ï Can achieve the high grinding strength of sand wheel and polishing precision of polishing slurry
    Ï high strength and good flexility of coating film making an ideal curving face polishing effort
    Ï Suitable for dry polishing as well as polishing with water or oil
    Application:
    Ï Can be used for many materials’ high precise polishing processing and lens polishing
    Ï Micro motor commuters and shafts
    Ï Precise polishing of metal rollers
    Ï Precise polishing of Magnetic heads and hard discs
    Ï Grinding and polishing of optical materials
  • Grish precise SiC polishing film
    Features:
    Ï The product grinding aid is the good shaped micro or nanometer SC green micro powder with good cutting ability and high abrasive resistance
    Ï Adherend adopts the macromolecule material and has the perfect characteristics of water proof and alcohol resistance
    Ï Unique formulation technique ensures the evenly suspension of the grinding aid granularity
    Ï Stable high quality and little dislike of different batches
    Ï high strength and good flexility of coating film making an ideal polishing effort
    Ï Can achieve the high grinding strength of sand wheel and polishing precision of polishing slurry
    Ï Suitable for dry polishing as well as polishing with water or oil
    Application:
    Ï Can be used for many materials’ high precise polishing processing and lens polishing
    Ï Grinding and polishing of plastic optical fiber
    Ï Rough polishing of ceramic optical fiber
    Ï Fine grinding and polishing of disk magnetic heads
  • Grish precise Sio2 polishing film
    Grish polishing film SO0.01-66A is special researched and developed for the final polishing of optical fiber connector. There will be no unexpected scratch or defect on the surface of connector and mo matter the optical height or reflect weaken data can reach to the international standard.
    Grish polishing film is formed by the drying and solid reaction after the mixing of Sio2 micro powder and high efficiency adherent. Transparent or semitransparent polishing film can be formed after the evenly distribution because the fineness and size of polishing granularity is smaller than the wavelength of visible light.
    Only the clean water is needed as the polishing medium when use SO0.01-66A. During the polishing process, the nanometer coating will release polishing granularities gradually which will attend the polishing function to make the surface of optical fiber superb smooth. The polishing film can be recycling used. However, the reusing times are different according to the types of grinding machines, polishing condition and polishing quality.
    Usage method:
    1. make sure that there is no scratch or defect on the surface of optical fiber after D1 fine polishing
    2. Clean the polishing jigs and rubber mat totally and ensure the surface of rubber mat is perfect and without any objects.
    3. Spray certain water on the surface of rubber mat and stick the polishing film onto it as soon as the surface is dry
    4 spray certain water on the surface of the polishing film and cleanse it with paper towel to get rid of the air under the polishing film
    5. blow the polishing film surface with compressed air to get rid of the dust and other objects
    6. drop certain water again on the surface of polishing film
    7. put the connector jig carefully and make them touch evenly, after that increase certain press, set the polishing time and start the grinding machine to begin polishing
    8.after the stop of grinding machine, get the jigs and polishing film carefully and make them dry for the repeated usage
  • Diamond Polishing Slurry
    GRISH diamond slurry is developed under the advantage of the superior diamond powders produced by ourself manufacturing including PCD, DND and MD series suit for most different applications. It is comprised of diamond powder, dispersant and liquid mediums water or oil. It possesses good dispersibility, uniformly particle size distribution, complete range of specifications and stable performance, widely used for the hard materials lapping and polishing. Features:

    Polycrystalline Diamond Slurry (PCD SLURRY)
    Ï Formed by explosive process
    Ï High precision finish with good stock removal rate and without scratch
    Ï Excellent surface finish on very hard materials such as: ceramic, glass and hard alloy.
    Ï Black in color

    Monocrystalline Diamond Slurry (MD SLURRY)
    Ï Produced under high pressure and temperature
    Ï Multifaceted sphere-cuboid shape for strength and efficiency
    Ï Tough Monocrystalline structure with minimal friability
    Ï General purpose applications
    Ï Gray in color

    Nano Diamond Slurry (ND SLURRY)
    Ï Made from the detonation of high power explosives and dispersed uniformly in the water
    Ï High stability on dispersion
    Ï Widely used for ultra precision polishing.
    Ï Gray or black in color
    Notes
    Before use, shake bottle of slurry well to ensure that all the grits are evenly suspended.

    Packaging:
    500ml/ bottle

    Storage:
    Ï Keep temperature above 0°C (32 °F)
    Ï Frozen can result in irreversible product degradation

    Safety Information: see the MSDS.
  • CMP POLISHING SLURRY
    GRISH Chemical Mechanical Polishing (CMP) Slurries are colloidal silica liquid made of high purity de-ionized water, highly engineered chemical additives and abrasives that chemically and mechanically interact with work piece surface to remove excess materials, therefore smooth or flatten the surface. They are widely used for nanometer scale chemical mechanical polishing fields such as silicon wafers, compound crystals, optical apparatus, and sapphire polishing. The slurries have a wide range of diameter from 10 to 150 nm to meet different requirements. There are alkaline and acidic slurries based on the pH.
    GRISH CMP slurries are developed under the concepts of high purity, high removal rate, high dispersion and scratch-free performance. GRISH supplies CMP polishing slurry to customers around the world and is the most competitive in quality and price.

    Features
    Ï High speed polish: with large particle of colloidal silica (Grit size up to 150 nm)
    Ï Controllable size: a wide range of custom-graded colloidal silica slurries from 10 to 150 nm that suits individual needs and applications
    Ï High purity: the content of Cu2+50 ppb, without contamination on the work piece
    Ï Super-smooth polishing: with the particle of SiO2, avoid scratch on the object surface
    Packaging:
    500 ml/ bottle, 25 kg or 200 kg/ barrel.
    Customizations are available upon requests.

    Storage:
    Keep the stored temperature at 0~35 (32~95 °F). Frozen can result in irreversible product degradation below 0 . High temperature above 35  may accelerate the growth of micro-organisms and gelation, as well as decrease the long-term stability of the silica sol. Generally, the storage time of alkaline slurries is about two years and of acidic slurries is about half a year.
  • Grish Ceo2 polishing slurry
    The precise polishing slurry produced by our company adopts the ultra fine Ceo2 and its main ingredients are nanometer or micro CeO2. All these granularities are cubic shape. Good dispersivity, fine granularity, evenly grit distribution and modest hardness make this polishing slurry fit for the fine polishing of high precise optical fiber materials, electro glass, crystal glass, glass hard disk, crystal surface and integrated circuit etc. This product has the characteristics as follows: convenient usage, good suspension ability, high polishing efficiency, superior precise of polishing precision and stable and reliable quality.
    Notes:
    1. Before use, shake bottles of slurry well to ensure that all the grits are evenly suspended.
    2. Dilute slurry by small amount of water.

    Packing: 500ml/ bottle

    Storage:
    Ï keep temperature above 0 to avoid frozen
    Ï Frozen can result in irreversible product degradation.

    Safety information: see the MSDS.
  • Precise polishing fabric
    GRISH precise polishing fabric is produced by the advanced slurry coating technology through coating the abrasives on the textile materials. It is perfect for removing foreign matters on glass panels.
    Features:
    1 Excellent cleaning performance for TFT-LCD panel
    2 Complete elimination by chip pocket and superior surface
    finishing result scratches free
    3 High adhesive ability avoiding abrasives falling off

    Application:
    Cleaning of the TFT-LCD panel during the Cell process before the polarized film attached, such as sealing resin, dust, contamination and glass cullet.
  • GRISH Monocrystalline Diamond Powder
    Grish monocrystalline diamond powder is comprised of fine quality diamond to a high standard. It is produced with special technology process including ball grinding, separation and purification. All Grish’s diamond powders accord with high purity technical standard. Based on international standard and user’s practical requirement, Beijing Grish created a specific standard for monocrystalline diamond powder product, Grish can also make adjustment of the product based on customer’s special needs on particle size, distribution, purity, etc.

    Features:

    Ï Strictly controlled monocrystalline diamond material process to ensure high quality and consistency

    Ï Narrow particle size distribution to ensure polishing efficiency, avoid unexpected scratch

    Ï High purity, metal impurity content below 100ppm

    Ï Line-up grits for customers to choose, nanometer size powders are also available besides micron and submicron grits.

    Ï Strict detect means ensure consistency between different batches.
    Applications:

    Ï As super hard abrasive materials, used for diamond grinding tools such as resin adhesive tools, metal bonding tools, electroplating tools

    Ï As fine polishing abrasives, used for various polishing process in industry and scientific fields, such as process for metal mold, precious stone, ceramics, as well as glass components

    Ï As an additive material in composite, utilizing its excellent thermal conductivity or electrical insulation characteristics .

    Ï Raw material to make PCD or PDC products.

    To request additional product information or other technical support, please contact us.
  • Grish Polycrystalline Diamond Powders
    GRISH detonation polycrystalline diamond (PCD) is similar with natural Carbonado in the structure. There’re thousands of micro crystallites size of 3-10nm integrated together into polycrystalline structure through unsaturated bond. PCD has many more cutting surfaces, resulting in the higher removal rates. It also has good self-sharpening properties. The polycrystalline structure will open every time new sharp edges introduced by releasing an outer layer of dull crystallites. The polycrystalline diamond can lap and polish any materials fast while produce the smoothest surface without scratches.
    Features:
    Ï High removal rates and good self-sharpening properties can achieve superior finishes to any hard materials.
    Ï High purity, impurity content below 0.5%.
    Ï High wearability and long working life.

    Applications:
    Ï Used as high precise abrasives:
    Ï Sapphire process, such as back lapping and polishing of sapphire-based LED epitaxial wafers
    Ï Lapping and polishing of magnetic heads, hard disk, CMOS chips, ceramics, glass, hard alloy, optics lens, etc
    Ï Used as additives for the electroplating films of metal molds, tools, metal parts to improve their wear resistance, surface hardness and service life
  • Grish Nano-diamond
    GRISH Nano-diamond is made from the detonation of high power explosives under minus balance of oxygen. The detonation brings out a proper diamond-growing condition with high temperature, super high pressure and isolated carbon atoms. Nanodiamond is different from normal synthetic diamond. It is round without any edges and corners and its crystal size is about 3-15nm.
    Features:
    Ï High dispersibility and high dispersion stability
    Ï Various particle sizes to meet different request
    Ï High purity, impurity metal is below 10ppm
    Ï Excellent polishing performance, surface roughness is below 1nm
    Ï Excellent wear resistance, corrosion resistance and thermal conductivity

    Applications:
    Ï As high precisise abrasives, used for the surface finish of magnetic heads, rigid discs
    Ï Additives to lubricant and engine oil to improve the running performance of industrial machines and vehicles, reduce down time, prolong service life
    Ï As hardening and wear resistance agent, used for the electroplating films on molds, tools, metal components to improve their wear resistance, surface hardness, and service life
    Ï Reinforced additives to metals, rubbers and plastics
    Ï Encapsulation materials used for IT production
    Ï Used in magnetic record system
    Ï Field Emission, CVD film
  • GRISH Nano-graphite
    GRISH Nano-graphite is synthesized by the detonation of high power explosive mixing with graphite which is put into a chamber. During the process of detonation, high temperature and pressure can be caused. Under this condition, large amount of dissociative carbon atom integrate into nano-sized graphite.
    Features:
    Ï Small and homogeneous particle dimension
    Ï High specific surface area , porous structure
    Ï High thermal-stability and good performance of electriconduction and heatconduction
    Ï Good performance of lubrication, anti-corrosion and thermal conductivity

    Applications:
    Ï For the feature of small and homogeneous particle dimension, can be used as nano-scaled compound-material or compound-paint additive.
    Ï For the feature of high-purity and high specific surface area make it better to be hydrogen storage material than other materials.
    Ï For the feature of high thermal-stabilityelectric/ anti-corrosion performance and thermal-conduction features make it to be good electric and thermal conductive material.
    Ï Additive to lubricant can diminish the friction coefficient and improve the ability of antifriction, resistance to ultimate-pressure and resistance to high temperature.
  • Grish ultra fine a-Ao polishing powder
    ±-Al2O3 powder manufactured by GRISH can provide a crystallite size of 20-40 nm and different particle size according to the customers’ requirements. This powder is characterized with high purity, excellent crystal shape, and uniform particle distribution.
Cooperation:
  • distributors wanted-polishing material
    Grish is currently looking for international distributors and sales Reps. From all over the world.The qualified distributor may have an agency for Grish
    products within a trade territory.



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